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Articles by keyword: «Single Wafer»

• A Theoretical and Experimental Study of Damage-Free BEOL Cleaning with Megasonic Agitation
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p151)
• Advanced Aqueous Cleaner II: PER Removal from Sensitive Cu/Low-k Devices
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p373)
• Alternative Post-Etch Polymer Removal in a Single-Wafer Platform
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p247)
• Elimination of Watermark on Extremely High-Doped Poly-Silicon Surfaces Using HF-Vapor Cleaning
  Published in: Ultra Clean Processing of Semiconductor Surfaces VIII (p27)
• Etch Rate Depth Profiling by Single Wafer Etching Equipment
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p107)
• Novel Back Side Processes for Copper and Pre-Lithography Cleans
  Published in: Ultra Clean Processing of Silicon Surfaces V (p89)
• Performance of a Linear Single Wafer IPA Vapour Based Drying System
  Published in: Ultra Clean Processing of Silicon Surfaces VII (p75)
• Removal of Small (<100-nm) Particles and Metal Contamination in Single-Wafer Cleaning Tool
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p157)
• Single Wafer Immersion Process Incorporating a Novel Megasonics Configuration with an Advanced IPA Vapor Condensation Dry
  Published in: Ultra Clean Processing of Silicon Surfaces VI (p45)