Study of Magnetic Fields of Magnetron Sputtering Affecting CrN Films

Ming Der Jean; Maw Tyan Sheen; Ching Fu Wu; Feng Ming Chen; San Jen Lee

doi:10.4028/www.scientific.net/AMM.401-403.822

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vols. 401-403Study of Magnetic Fields of Magnetron Sputtering...

Study of Magnetic Fields of Magnetron Sputtering Affecting CrN Films

Abstract:

This article presents the distribution of the varying magnetic field and its effect by magnetron sputtering on mechanical properties of CrN films. The magnetic field variations in the sputtering processes were explored, and the strength of magnetic field in the unbalanced magnetic sputtering systems is controlled. In addition, the microstructure, composition and surface properties of CrN films prepared by magnetron sputtering were investigated. At a GDMT of 27mm, the highest wear rate value and hardness values seems to be appeared, while the higher critical force value appears to occur at 49mm GDMT during 18 tests. The experimental results have showed that in the enhancement in overall intensity at the gap distance of 27mm between magnet set and the target surface (GDMT), magnetic field strength varied having a significant influence on the CrN structures was readily noticeable, while the wear scar curve at 49mm GDMT possessed better tribological properties than those of the others. Thus, magnetic field variations play a crucial role in determining the properties of the films

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Periodical:

Applied Mechanics and Materials (Volumes 401-403)

Pages:

822-827

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.401-403.822

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Online since:

September 2013

Authors:

Ming Der Jean, Maw Tyan Sheen, Ching Fu Wu, Feng Ming Chen, San Jen Lee

Keywords:

Chromium Nitride, Magnetic Field, Magnetron Sputtering, Wear Rate

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