Graded Silicon Nanostructure Arrays for Tailoring Antireflection Performances

Abstract:

Advances in nanofabrication have resulted in great potentials for improving in both device performance and the manufacturing process of various applications. One revolutionary example is silicon (Si) nanostructures, typically using Si nonopore arrays or Si nonowire arrays, to construct high efficient and low-cost solar cells. In this work, we develop the innovative combined nanostructure arrays with tailored structural profiles using inexpensive, simple and rapid etching processes, whose total reflection is suppressed to 1.6%, approximately 39% less than Si nonopore arrays, and 20% less than Si nanowire arrays. In addition, systematic investigations on wettability of textured Si surfaces reveal the inherent surface oxidation during etching process. These combined nanostructure arrays with tailored antireflection performances, along with the in-depth studies of underlying etching mechanisms, may benefit both the yield and cost efficiently in industrial standard of silicon solar cells.

• Periodical: Applied Mechanics and Materials (Volumes 479-480)
• Pages: 105-109
• DOI: https://doi.org/10.4028/www.scientific.net/AMM.479-480.105
• Online since: December 2013
• Authors: Cheng Chuan Wang, Chia Yun Chen, Ya Ching Chou
• Keywords: Antireflection, Etching, Silicon Nanostructures, Wetting Property

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