Inductively Coupled Plasma Modified Silica Material Technology Research

Li Li; Ying Qian Jia; Jian Li Zhao; Yan Yan Gao

doi:10.4028/www.scientific.net/AMM.483.47

Paper Titles

Effect of the Process Parameters of Laser Cladding on Microstructure of Ni-Based Titanium Carbide
p.28

Research on the Activity of Calcium Oxides under Various Calcination Temperatures
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Catalytic Synthesis of Benzyl Acetate by Diatomite Supported Waugh-Type (NH₄)₆[MnMo₉O₃₂] •8H₂O
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The New Technology of Preparation Activated Carbon from Lignite
p.42

Inductively Coupled Plasma Modified Silica Material Technology Research
p.47

A Simple and Practicable PCR-Microchip with Bubble-Free Stationary Chamber
p.51

Synthesis and Evalution of Enteric Aqueous Polymethacrylate Coating Material
p.56

The New Technology of Precision Grinding High Performance Ceramic Materials
p.61

Synthesis of CuIn_0.7Ga_0.3Se₂ Nanoparticles and its Quarternary Sputtering Target
p.65

HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 483Inductively Coupled Plasma Modified Silica...

Inductively Coupled Plasma Modified Silica Material Technology Research

Abstract:

The using inductively coupled plasma etching techniques, the surface of fused silica was etched by CF4 as etching reaction gases. The results show that the fused silica surface scratches buried defects can be effectively removed with no replication effect, with the etching process proceeds, fused silica at 355nm laser light R: 1 under irradiated, the initial damage threshold of component surface is worth to an effective improved, damage resistance level of element surface more balanced, low damage threshold is worth to significantly improve.

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Periodical:

Applied Mechanics and Materials (Volume 483)

Pages:

47-50

DOI:

https://doi.org/10.4028/www.scientific.net/AMM.483.47

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Online since:

December 2013

Authors:

Li Li*, Ying Qian Jia, Jian Li Zhao, Yan Yan Gao

Keywords:

Damage Threshold, Inductively Coupled, Plasma, Quartz, Spectroscopy, Surface Morphology

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References

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