Fabrication of Artificial Periodic Defects in Colloidal Photonic Crystals by Photolithography

Yong Qiang Zhao; Yu Song Zhi; Chao Rong Li; Xiao Bo Zhang

doi:10.4028/www.scientific.net/AMM.665.99

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HomeApplied Mechanics and MaterialsApplied Mechanics and Materials Vol. 665Fabrication of Artificial Periodic Defects in...

Fabrication of Artificial Periodic Defects in Colloidal Photonic Crystals by Photolithography

Abstract:

We introduce artificial periodic defects with required size in colloidal photonic crystals by a simple and inexpensive photolithography. The morphology of colloidal photonic crystals with defects is observed by field emission scanning electron microscope (SEM) and optical properties by UV-VIS spectra. We find that the periodic photoresist strips will cause a blue shift and the shift value depends on the the size of periodic photoresist strips.

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Applied Mechanics and Materials (Volume 665)

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99-101

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https://doi.org/10.4028/www.scientific.net/AMM.665.99

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Online since:

October 2014

Authors:

Yong Qiang Zhao, Yu Song Zhi, Chao Rong Li, Xiao Bo Zhang*

Keywords:

Artificial Periodic Defects, Blue Shift, Colloidal Photonic Crystals

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* - Corresponding Author

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