Influence of Sputtering Power on Structural and Optical Properties of ZnO Films Fabricated by RF Magnetron Sputtering

Abstract:

ZnO thin film has been fabricated on sapphire substrate (0001) using RF magnetron sputtering at room temperature. The influence of sputtering power ranging from 10 W to 70 W on the microstructural and optical properties of ZnO films is investigated by atomic force microscopy (AFM), X-ray diffraction (XRD), ultraviolet-visible spectrophotometer. The AFM results show that with the increase of sputtering power, the size of ZnO crystalline increases first, then decrease and the maximum grain size occurs at 50 W. The XRD measurements indicate that the ZnO films with wurtzite structure are highly c-axis orientation and the film fabricated at 50 W has the best crystalline quality. Optical transmission spectra of the ZnO samples demonstrate that the ZnO film obtained at 50 W has the higher average transmission (above 90%) in the visible-light region and its optical band gap is 3.26 eV.

• Periodical: Advanced Materials Research (Volume 1053)
• Pages: 325-331
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1053.325
• Online since: October 2014
• Authors: Yang Zhou, Hong Fang Zheng, Guang Zhao, Man Li, Bao Ting Liu
• Keywords: Optical Property, RF Magnetron Sputtering, Sputtering Power, Structural Properties, ZnO Film

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