Multifractal, Structural and Optical Properties of HfO₂ Thin Films

Abstract:

HfO₂ films were sputter deposited under varying substrate temperatures (T_s) and their structural and morphological characteristics, optical properties were systematically studied by means of X-ray diffraction (XRD), atomic force microscope (AFM), and UV/VIS spectrophotometry. A statistical analysis based on multifractal formalism shows the uniformity of the height distribution increases as T_s is increased and the widths Δα of multifractal spetra are related to the average grain size D _(-111) as Δα ∼ [D_(-111)]^-0.83. The monoclinic HfO₂ is highly oriented along (-111) direction with increasing T_s. The Lattice expansion increases with diminishing HfO₂ crystalline size below 7 nm while maximum lattice expansion occurs with highly oriented monoclinic HfO₂ of crystalline size about 14.8 nm. The film growth process at T_s ≥ 200°C with surface diffusion energy of ∼ 0.29 eV is evident from the structural analysis of HfO₂ films.

• Periodical: Advanced Materials Research (Volume 1053)
• Pages: 343-350
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1053.343
• Online since: October 2014
• Authors: Zhi Li, Chun Yu Ma, Qing Yu Zhang
• Keywords: Hafnium Dioxide, Multifractal Analysis, Structural, Substrate Temperature

References

[1] C.D. Pemmaraju and S. Sanvito, Phys. Rev. Lett. 94 (2004) 217205.

[2] L. Armelo,H. Bertagnolli, D. Bleiner, M. Groenewolt, and S. Gross, Adv. Funct. Mater. 17 (2007)1671.

[3] G. D. Wilk, R. M. Wallace, and J. M. Anthony, J. Appl. Phys. 89 (2001) 52443.

[4] S. Sayan, S. Aravamudhan, B.W. Busch, W.H. Schulte, F. Cosandey, G. D, wilk, T. Gustafsson, and E. Garfunkel, J. Vac. Sci. Technol. A20 (2002) 507.

[5] T. Nishide, S. Honda, M. Matsuura, and M. Ide, Thin Solid Films 371 (2000) 61.

[6] S.J. Wang, P.C. Lim, A.C.H. Huan, C.L. Liu, J.W. Chai, S.Y. Chow, J.S. Pan, Q. Li, and C.K. Ong, Appl. Phys. Lett. 82 (2003) (2047).

[7] K. Cherkaoui, S. Monaghan, M.A. Negara, M. Modreanu, P.K. Hurley, D.O. Connell, S. McDonnell, G. Hughes, S. Wright, R.C. Barklie, P. Bailey, and T.C.Q. Noakes, J. Appl. Phys. 104 (2001) 064113.

DOI: 10.1063/1.2978209

[8] S. Bruns, M. VergÖhl, O. Werner, and T. Wallendorf, Thin Solid Films 520(2012) 4122.

DOI: 10.1016/j.tsf.2011.07.014

[9] B.B. Mandelbrot, Pure Appl. Geophys, 131(1989)5.

[10] R. Lopes and N. Betrouni, Med. Image Anal. 13 (2009) 634.

[11] D. Labat, A. Mangin, and R. Ababou, J. Hydrol 256 (2002) 176.

[12] A. Chhabra and R.V. Jensen, Phys. Rev. Lett. 62(1989) 1327.

[13] A Chaudhari, C.C.S. Yan and S.L. Lee, Appl. Surf. Sci. 238(2004)513.

[14] D. Raoufi, H.R. Fallah, A Kiasatpour, and A.S.H. Rozatian Appl. Surf. Sci. 254 (2008)2168.

[15] Z.W. Chen, X.P. Wang, S. Tan, S.Y. Zhang, J.G. Hou, and Z.Q. Wu, Phys. Rev. B63 (2001) 165413.

[16] Cisneros-Morales and M.C. Aita, Appl. Phys. Lett. 96 (2010) 191904.

[17] M Ohring, Materials Science of Thin Films, (Academic Press, San Diego 2002), p.641.

[18] C.V. Ramana, K. Kamala. Bharathi, A. Garcia, and A.L. Campbell, J. Phys. Chem, C 116(2012)9955.

[19] S.K. Gullapalli, R.S. Vemuri, and C.V. Ramana, Appl. Phys. Lett. 96 (2010) 171903.

[20] H.J. Li, C.Y. Pu, C.Y. Ma, Sh. Li, W.J. Dong, S.Y. Bao, and Q.Y. Zhang, Thin Solid Films 520(2011) 212.