Microstructural Changes in Co Films Depending on MOCVD Conditions

Rustam Hairullin; Svetlana Dorovskikh

doi:10.4028/www.scientific.net/AMR.1085.12

Paper Titles

Preface, Conference Organization and Sponsors

Analysis of Structural Features of Humic Acids Fractions after Mechanochemical Modification
p.3

Synthesis of Cobalt Nanopowder Using Surfactants of Different Nature
p.7

Microstructural Changes in Co Films Depending on MOCVD Conditions
p.12

Direct Synthesis of Propylene from Ethylene over Palladium Containing Catalysts: Influence of the Support Nature
p.17

Study of Phenol Oxidation Products over Glassy Carbon Electrode in Alkaline Solutions by Photoluminescence Spectroscopy
p.23

The Catalysts Synthesis Methanol for Direct Synthesis of Dimethyl Ether from Synthesis Gas
p.29

Research of Formation Plasma-Chemical Process Particles of Oxides Metals with Specified Morphology
p.34

Synthesis of Silicon Carbide in Hypervelocity Plasma Jet
p.38

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1085Microstructural Changes in Co Films Depending on...

Microstructural Changes in Co Films Depending on MOCVD Conditions

Abstract:

In this work the effect of substrate and vaporization temperatures on the structural parameters (sizes of coherent scattering region, values of strain), phase and chemical composition, surface morphology of Co films is revealed. Co films were deposited on Si (100) substrates by Metal-organic chemical vapor deposition using the diiminate complex Co (N’acN’ac)₂ as a precursor. The sizes of coherent scattering region, values of strain and phase composition of Co films were determined by the X-ray diffraction analysis. The chemical composition was identified by the Energy-dispersive X-ray spectroscopy. The surface morphology of Co films was investigated by scanning electron microscope. It is found that the variation of deposition conditions allows us widely to change structural parameters and chemical composition of Co films.

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Periodical:

Advanced Materials Research (Volume 1085)

Pages:

12-16

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1085.12

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Online since:

February 2015

Authors:

Rustam Hairullin*, Svetlana Dorovskikh

Keywords:

Chemical Composition, Co Films, MOCVD, Strain, Substrate Temperature, Surface Morphology, Vaporization Temperature

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