Phosphorous Incorporated-Silicon Nanoparticles Synthesized Using Double Tube Reactor and Inductive Coupled Plasma

Abstract:

Phosphorous (P) incorporated silicon nanoparticles (Si NPs) were synthesized by using inductive coupled plasma (ICP) and a specially designed double tube reactor.Their microstructures were investigated by injecting various amounts of PH₃ gas during the synthesis. Injection of PH₃ gas during the synthesis resulted in a change from crystalline to amorphous phase, a reduction of particle size as well as process yield. These results were attributed to a lower plasma density when higher amount of PH₃ was injected.From EDS, SIMS and XPS analysis, it was revealed that P was successively incorporated in Si NPs.However, secondary phases such as P₄ (red P) and P₂O₅were formed as amorphous ones in nanoscale when a relatively large amount of PH₃ was injected.

• Periodical: Advanced Materials Research (Volume 1091)
• Pages: 9-14
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.1091.9
• Online since: February 2015
• Authors: Jeong Boon Koo, Chun Young Jung, Bo Yun Jang*
• Keywords: Incorporations, Inductive Coupled Plasma, Phosphorous, Silicon Nanoparticles

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