Annealing Time Influence on Optical Characteristic of Beta-FeSi2 Thin Film

Xi Cheng Xiong; Shuang Shuang Kang; Qian Chen; Jin Huang; Quan Xie; Jin Min Zhang

doi:10.4028/www.scientific.net/AMR.1096.62

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 1096Annealing Time Influence on Optical Characteristic...

Annealing Time Influence on Optical Characteristic of Beta-FeSi₂ Thin Film

Abstract:

In this paper, we have prepared the beta-FeSi₂ thin film on Si substrate through the direct current magnetron sputtering technology. We have tested the samples by XRD, optical digital microscope (ODM), spectrophotometer, and SEM. Under the same annealing temperature at 1153 K, the annealing time has important influence on the optical characteristic of beta-FeSi₂ thin film. More the thickness of the beta-FeSi₂ thin film is thinner, and more the absorptivity of photo is higher. We should use the thinner beta-FeSi₂ thin film with appropriate value of the thickness and must adopt the anti-reflection layer to fabricate the solar cell.

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Periodical:

Advanced Materials Research (Volume 1096)

Pages:

62-68

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.1096.62

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Online since:

April 2015

Authors:

Xi Cheng Xiong, Shuang Shuang Kang, Qian Chen, Jin Huang, Quan Xie*, Jin Min Zhang

Keywords:

Annealing Time, Beta-FeSi₂, Influence, Optical Characteristic, Thin Film

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