A Key Parameters Analysis Method of the Quality Control in the Semiconductor Multiple Manufacturing Processes Based on Functional Data Analysis Method

Article Preview

Abstract:

The quality of the semiconductor products is defined by a series of the key performance parameters which have some certain relations to the electronic test parameters generated among the multiple manufacturing processes. Aimed at the quality control problem of the multiple manufacturing processes, a FDA (functional data analysis) method has been used and got the mapping relationship between the process parameters of the product lines and the product quality characteristic. A simple Change-Point hypothesis has been tested to analyze the data curves generated by the FDA method, and the key process variables have been found. Then, the equalization between the new test result and the old one has been verified by the Kolmogorov-Smirnov 2-sample test method. Some multiple manufacturing processes test data, which was collected from a semiconductor product workshop, has been modeled and analyzed. And the analysis results can illustrate the key factors of the process quality control in the multiple manufacturing processes and approach the reduction of the test times and the improvement of the efficiency and effectiveness of the equipment.

You might also be interested in these eBooks

Info:

Periodical:

Advanced Materials Research (Volumes 139-141)

Pages:

1660-1665

Citation:

Online since:

October 2010

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2010 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] Z.T. Wang, F. Qiao, and Q. D. Wu: Proc. of the 2006 IEEE International Conference on Automation Science and Engineering(Shanghai, China, October 7-10, 2006). Vol. 1, pp.253-269.

Google Scholar

[2] A.J. Su, J.C. Jeng, H.P. Huang, C.C. Yu, S.Y. Hung and C.K. Chao: Control Engineering Practice, Vol. 15 (2007) No. 10, pp.1268-1279.

Google Scholar

[3] Z.Q. Mao, W. Kang, F. Wang and P. Raulefs: Journal Process Control, Vol. 18 (2008) No. 10, pp.954-960.

Google Scholar

[4] S.Q. Wang, X.P. Zhang and L. Chen: Journal of Zhejiang University(Engineering Science), Vol. 42(2008), No. 8: pp.1393-1398. (In Chinese).

Google Scholar

[5] J. Wang, Q. P. He and T. F. Edgar: Journal Process Control, Vol. 19 (2009) No. 3, pp.443-456.

Google Scholar

[6] A. A. Khan, J.R. Moyne and D.M. Tilbury: Journal Process Control, Vol. 18 (2008) No. 10, pp.961-974.

Google Scholar

[7] S.J. Wang, Y.M. Chen, X.D. Wang, Z.Z. Li and L.C. Shi: Chinese Journal of Electronics, Vol. 9 (2000) No. 1, pp.1-5.

Google Scholar

[8] H. Yue, T.X. Zhao, P.J. Ma, and D.F. Zhou: Acta Electronica Sinica, Vol. 27 (1999) No. 8, pp.19-22. (In Chinese).

Google Scholar

[9] O. Ramsayj, C. J. Dalzell: Journal of the Royal Statistical Society, Series B(Methodological), Vol. 53 (1991) No. 3, pp.539-572.

Google Scholar

[10] N. Jin, S.Y. Zhou, T.S. Chang, and H. H. Huang: Automation Science and Engineering, Vol. 5 (2008) No. 3, pp.557-562.

Google Scholar

[11] O. Ramsayj, B.W. Silverman: Functional Data Analysis (Springer , New York, U.S. A 2006), pp.84-85.

Google Scholar

[12] W. G. Manteigaa and P. Vieu: Computational Statistics & Data Analysis, Vol. 51 (2007) No. 10, pp.4788-4792.

Google Scholar

[13] X.R. Chen: Science in China, Ser. A, Vol. 31 (1988) No. 6, pp.654-667.

Google Scholar

[14] J.L. Wang and M.I. Bhatti: Chinese Journal of Applied Probability and Statistics, Vol. 14 (1998) No. 2, pp.113-121.

Google Scholar