Preparation and Characterization of Ce-Implanted TiO2 Thin Films

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TiO2 thin films were successfully deposited on microscope glass slides by means of d.c. sputtering method using Ar and O2 as the working gases. Then Ce ions at nominal doses of 2×10 16ions/cm2 and 2×1017ions/cm2 were implanted into the TiO2 thin films to observe the effects of implantation on the photocatalytic activities of the TiO2 thin films. The photocatalytic activities of the samples were evaluated by the photodegradation of Rhodamine B solution. It was found that Ce ions implantation decreased the photocatalytic activities of the TiO2 thin films and the results were discussed.

Info:

Periodical:

Advanced Materials Research (Volumes 194-196)

Edited by:

Jianmin Zeng, Taosen Li, Shaojian Ma, Zhengyi Jiang and Daoguo Yang

Pages:

2296-2299

DOI:

10.4028/www.scientific.net/AMR.194-196.2296

Citation:

S. K. Zheng "Preparation and Characterization of Ce-Implanted TiO2 Thin Films", Advanced Materials Research, Vols. 194-196, pp. 2296-2299, 2011

Online since:

February 2011

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$35.00

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