Preparation and Characterization of Ce-Implanted TiO2 Thin Films

Shu Kai Zheng

doi:10.4028/www.scientific.net/AMR.194-196.2296

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 194-196Preparation and Characterization of Ce-Implanted...

Preparation and Characterization of Ce-Implanted TiO₂ Thin Films

Abstract:

TiO₂ thin films were successfully deposited on microscope glass slides by means of d.c. sputtering method using Ar and O₂ as the working gases. Then Ce ions at nominal doses of 2×10 ¹⁶ions/cm² and 2×10¹⁷ions/cm² were implanted into the TiO₂ thin films to observe the effects of implantation on the photocatalytic activities of the TiO₂ thin films. The photocatalytic activities of the samples were evaluated by the photodegradation of Rhodamine B solution. It was found that Ce ions implantation decreased the photocatalytic activities of the TiO₂ thin films and the results were discussed.

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Periodical:

Advanced Materials Research (Volumes 194-196)

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2296-2299

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.194-196.2296

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Online since:

February 2011

Authors:

Shu Kai Zheng

Keywords:

Ce Ion Implantation, Photocatalytic Activity, TiO₂ Thin Films

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