Effect of RF Sputtering Power on the Structural, Optical and Hydrophobic Properties of SiNx Thin Film

Abstract:

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With a mixture gas of N2 and Ar, silicon nitride thin films were deposited on glass substrates by different radio frequency (RF) magnetron sputtering power without intentional substrate heating. The chemical composition, phase structure, surface morphology, optical properties, refractive index, hydrophobic properties of the films were characterized by X-ray energy dispersive spectroscopy(EDS), X-ray diffraction(XRD), field emission scanning electron microscopy(FESEM), ultraviolet-visible spectroscopy(UV-Vis), nkd-system spectrophotometer and CA-XP150 contact angle analyzer, respectively. The results showed that silicon nitride thin films were amorphous and rich in Si; the transmittance reduced but refractive index and surface roughness increased; and the hydrophobic properties of SiNx became better with the increase of RF power.

Info:

Periodical:

Advanced Materials Research (Volumes 194-196)

Edited by:

Jianmin Zeng, Taosen Li, Shaojian Ma, Zhengyi Jiang and Daoguo Yang

Pages:

2340-2346

DOI:

10.4028/www.scientific.net/AMR.194-196.2340

Citation:

H. Y. Liang et al., "Effect of RF Sputtering Power on the Structural, Optical and Hydrophobic Properties of SiNx Thin Film", Advanced Materials Research, Vols. 194-196, pp. 2340-2346, 2011

Online since:

February 2011

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Price:

$35.00

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