Design of a Novel TiO2 Thin Film Device

Hsien Chiao Teng; Anchi Yeh; Jhih Wei Hu; Yuan Tung Cheng; Shen Cherng; Yu Jung Hung

doi:10.4028/www.scientific.net/AMR.199-200.1751

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 199-200Design of a Novel TiO2 Thin Film Device

Design of a Novel TiO₂ Thin Film Device

Abstract:

Coating TiO₂ thin film with the thickness of 50 nm and the planar size of 6×6 mm² onto a dual band meander-planar patch radiator being printed on a FR4 substrate (relative permittivity εr= 4.4) by the size of 0.4×7×33.5mm³ is demonstrated in this report. The system is for the application of 2.4/5.2 GHz WLAN (Wireless Local Area Network) dual-band operation. Experimentally, the radiation gain was increased about 30% when part of the radiator governing the lower band coated with TiO₂ thin film. It is thus revealed the TiO₂ thin film can be a functional device to tune the radiation gain for the patch radiator.

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Periodical:

Advanced Materials Research (Volumes 199-200)

Pages:

1751-1755

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.199-200.1751

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Online since:

February 2011

Authors:

Hsien Chiao Teng, Anchi Yeh, Jhih Wei Hu, Yuan Tung Cheng, Shen Cherng, Yu Jung Hung

Keywords:

TiO₂ Thin Films, WLAN

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