Deposition of Titanium Nitride Film on Mg-Li Alloys by DC Reactive Magnetron Sputtering

Abstract:

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A number of studies have shown that TiN film is correlated with corrosion resistance. In this study, we used a reactive direct current magnetron sputtering system to prepare TiN coating on Mg-Li alloys at low temperature. The intermediate TiN layer of thickness was about 1.6 μm from Ti target (99.99% purity). The structures of the resulting nanocatalysts were investigated, using X-ray diffraction analysis (XRD). The surface morphology of the coating was observed by Atomic Force Microscope (AFM). In the corrosive compare experiment the samples of Mg-Li alloys with and without titanium nitride film were put in solution with 5% NaCl respectively. We fund that the Mg-Li alloys with TiN coating has a lower rate of liberation of hydrogen, and the eroded surface morphology was examined by Scanning Electron Microscopy (SEM), it prove that the TiN deposition on the surface of Mg-Li alloys has improved the corrosion resistance performance.

Info:

Periodical:

Advanced Materials Research (Volumes 204-210)

Edited by:

Helen Zhang, Gang Shen and David Jin

Pages:

1685-1690

DOI:

10.4028/www.scientific.net/AMR.204-210.1685

Citation:

Y. Q. Chen et al., "Deposition of Titanium Nitride Film on Mg-Li Alloys by DC Reactive Magnetron Sputtering", Advanced Materials Research, Vols. 204-210, pp. 1685-1690, 2011

Online since:

February 2011

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$35.00

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