Deposition of Titanium Nitride Film on Mg-Li Alloys by DC Reactive Magnetron Sputtering
A number of studies have shown that TiN film is correlated with corrosion resistance. In this study, we used a reactive direct current magnetron sputtering system to prepare TiN coating on Mg-Li alloys at low temperature. The intermediate TiN layer of thickness was about 1.6 μm from Ti target (99.99% purity). The structures of the resulting nanocatalysts were investigated, using X-ray diffraction analysis (XRD). The surface morphology of the coating was observed by Atomic Force Microscope (AFM). In the corrosive compare experiment the samples of Mg-Li alloys with and without titanium nitride film were put in solution with 5% NaCl respectively. We fund that the Mg-Li alloys with TiN coating has a lower rate of liberation of hydrogen, and the eroded surface morphology was examined by Scanning Electron Microscopy (SEM), it prove that the TiN deposition on the surface of Mg-Li alloys has improved the corrosion resistance performance.
Helen Zhang, Gang Shen and David Jin
Y. Q. Chen et al., "Deposition of Titanium Nitride Film on Mg-Li Alloys by DC Reactive Magnetron Sputtering", Advanced Materials Research, Vols. 204-210, pp. 1685-1690, 2011