PIC-MC Simulation Method of DC Discharge Plasmas

Fouzi Bouanaka; Saida Rebiaï; Hanene Bahouh; Salah Sahli

doi:10.4028/www.scientific.net/AMR.227.121

Paper Titles

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Electromagnetic Modeling of Microwave Axial Injection Torch at Atmospheric Pressure Used for Thin Film Deposition
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Modelling Sequential Impact of Molten Droplets on a Solid Surface in Plasma Spray Process
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Fluid Model Simulation of DC Glow Discharges
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PIC-MC Simulation Method of DC Discharge Plasmas
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Modeling of Detector Radiations Response P-I-N in Technology Thin Film on ASIC (TFA) Intended for Digitalization in Medical Imagery
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Effect of Argon Ambient Gas Pressure on Plume Expansion Dynamics
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Simulation of Geometry and Heat Transfer in a Thin Wall Produced by Direct Laser Powder Deposition
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Modeling the Formation of Periodic Nanostructures on Solid Surface Induced by Femtosecond Laser Ablation by Particle-in-Cell Method
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 227PIC-MC Simulation Method of DC Discharge Plasmas

PIC-MC Simulation Method of DC Discharge Plasmas

Abstract:

We propose in this paper a numerical particle type model PIC-MC (Particle-In-Cell Monte Carlo) for modeling plasma reactors in the case of DC discharge used for various industrial applications. The model is developed in the case of argon plasma at low pressure, generated in a reactor consisting of two flat electrodes parallel and spaced 3 cm. The collisions treatment is based on the “null collision” method. PIC-MC model can provide the plasma characteristics (potential, field and charge density) in inter-electrodes space, for all reactions in addition to collisions that may occur.