Cracking Behavior of Oxide Films under Applied Stress

Si Xian Rao; Su Ping Yang; Ji Bin Tong; Jing Ru Wang

doi:10.4028/www.scientific.net/AMR.284-286.671

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 284-286Cracking Behavior of Oxide Films under Applied...

Cracking Behavior of Oxide Films under Applied Stress

Abstract:

Cracking behaviors of oxide films on A3, 30CrMnSiA steel under applied stress were investigated in this paper. Theoretical deductions confirmed that critical cracking conditions for oxide films on A3 and 30CrMnSiA steel did exist. Electrochemical tensile experiments in 3%NaCl aqueous solution showed that the critical cracking stress for oxide film on A3 steel is about 220MPa,the critical cracking stress for oxide film on 30CrMnSiA steel is about 80MPa.In-situ dynamic tensile experiments verified the correctness of the experiments results in the electrochemical tensile experiments.

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Periodical:

Advanced Materials Research (Volumes 284-286)

Pages:

671-675

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.284-286.671

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Online since:

July 2011

Authors:

Si Xian Rao, Su Ping Yang, Ji Bin Tong, Jing Ru Wang

Keywords:

30CrMnSiA, A3 Steel, Applied Stress, Cracking, Oxide Film

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