Surface-Channel Drain-Avalanche Hot-Carrier Effect under Temperature Variation on CLC TFTs

Abstract:

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Continuous-wave green laser-crystallized (CLC) single-grainlike polycrystalline silicon n-channel thin-film transistors (poly-Si n-TFTs) exhibit the higher electron mobility and turn-on current than excimer laser annealing (ELA) poly-Si n-TFTs. Furthermore, high drain voltage accelerates the flowing electrons in n-type channel, and hence the energized electrons possibly cause a serious damage near the drain region and deteriorate the source/drain (S/D) current. Using this good reliability metrology to verify the quality of CLC n-TFTs was adopted. The degradation mechanisms of S/D current for CLC poly-Si n-TFTs were firstly investigated by measuring the gate-to-drain overlap capacitor, and with the drain-avalanche hot-carrier stresses at 2VGS = VDS =14 V and 2VGS =VDS =18 V in temperature environment, 25 oC and 50 oC.

Info:

Periodical:

Advanced Materials Research (Volumes 314-316)

Edited by:

Jian Gao

Pages:

1926-1929

DOI:

10.4028/www.scientific.net/AMR.314-316.1926

Citation:

M. C. Wang and H. C. Yang, "Surface-Channel Drain-Avalanche Hot-Carrier Effect under Temperature Variation on CLC TFTs", Advanced Materials Research, Vols. 314-316, pp. 1926-1929, 2011

Online since:

August 2011

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Price:

$35.00

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