High Resolution ITO Lithography Using Excimer Laser for Flat-Panel Display Fabrication

Xin Xing Wang; Jin Yun Zhou; Liang Lei; Qing Hua Lin; Ying Shi; Long Hua Mei

doi:10.4028/www.scientific.net/AMR.314-316.1910

Paper Titles

Study of Effect on Tensile Stress Test from Distortion of Fibre Laser Welded Ti6Al4V Using FEA
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Influence of Light Leakage from Q-Switched Laser on Laser-Induced Shock Wave
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Effect of Laser Surface Modification and Tempering Process on Microstructure and Hardness Profiles of Roll Materials
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Impact of Ni-2 Laser Cladding Coating on the Repeated Impact of the Dynamic Response
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High Resolution ITO Lithography Using Excimer Laser for Flat-Panel Display Fabrication
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Study on a New Way of Aligning the Focal Plane for the Laser projection Image System
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Instability Effect on CLC nTFTs with Positive-Bias Temperature Stress
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Probing Drain Current with Vertical and Horizontal Electrical Fields under Temperature Stress on CLC TFTs
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Surface-Channel Drain-Avalanche Hot-Carrier Effect under Temperature Variation on CLC TFTs
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High Resolution ITO Lithography Using Excimer Laser for Flat-Panel Display Fabrication

Abstract:

As the higher and higher demand for image definition of flat-panel display (FPD), the minimum linewidth of pixel electrode, which is based on the Indium-Tin-Oxide (ITO) glass, has become narrower and narrower. The feature size of sub-pixel electrode has been narrowed from about 60~100 µm to below 20 µm in recent years. Hence the lithography technology has played a more and more important role in the fabrication of FPD. The laser projection imaging (LPI) technology can solve the problems obviously. In this paper, by using of the 351nm XeF excimer laser projection imaging system we can obtain developed pictures at the resolution between 10 and 20 µm on the ITO glass. In addition, the relation graphs between 10~20 µm linewidth and the modulation transfer function（MTF）of the projection system are simulated and analyzed by the ZEMAX and MATLAB software. Consequently, our system can satisfy the linewidth of the sub-pixel electrode at the resolution between 10 and 20 µm in the production of FPD.