Potential of TaOXNY Thin Films Deposited by Reactive Sputtering as Antireflective Coatings: Composition and Optical Properties

Fadi Zoubian; Eric Tomasella; A. Bousquet; Thierry Sauvage; C. Eypert

doi:10.4028/www.scientific.net/AMR.324.73

Paper Titles

IAEA Activities on Cultural Heritage, Archaeology and other Characterization Applications
p.52

Effects of Aging Heat Treatment on the Microstructure of Ti-Nb and Ti-Nb-Sn Alloys Employed as Biomaterials
p.61

Effect of Powder Characteristics on the Densification of Sintered Alumina
p.65

Preparation and Characterization of High-Copper Restorative Dental Alloys Corrected
p.69

Potential of TaO_XN_Y Thin Films Deposited by Reactive Sputtering as Antireflective Coatings: Composition and Optical Properties
p.73

Pulsed Laser Deposition of Tungsten Thin Films on Graphite
p.77

Nature and Role of Various Si-Based Sensitizers for Er³⁺ Ions in Silicon-Rich Silicon Oxide Thin Films
p.81

Compliance at the GaSb/GaP Interface by Misfit Dislocations Array
p.85

Streamer-Surface Interaction in Heptane with Micro-Gaps
p.89

HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 324Potential of TaOXNY Thin Films Deposited by...

Potential of TaO_XN_Y Thin Films Deposited by Reactive Sputtering as Antireflective Coatings: Composition and Optical Properties

Abstract:

Tantalum oxynitride thin films are deposited by radio-frequency magnetron sputtering using a pure tantalum target under argon/oxygen/nitrogen gas mixture. The argon flow is kept constant while the oxygen and nitrogen flows are changed simultaneously in a way to keep constant the total flow of these reactive gases. We succeed to deposit TaO_xN_y films with stoichiometry ranging between those of TaN and Ta₂O₅. All films are deposited at room temperature and are amorphous. Spectroscopic ellipsometry and UV-visible spectrometry investigations show a direct relation between the optical properties and the stoichiometry of the films. In particular, the results show a variation of the refractive index from pure tantalum nitride-like films (3.76) to tantalum pentoxyde-like films (2.1), which confirms the possibility to deposit graded antireflective coatings with tantalum oxynitride.

You might also be interested in these eBooks

Advances in Innovative Materials and Applications

View Preview

Info:

Periodical:

Advanced Materials Research (Volume 324)

Pages:

73-76

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.324.73

Citation:

Cite this paper

Online since:

August 2011

Authors:

Fadi Zoubian, Eric Tomasella, A. Bousquet, Thierry Sauvage, C. Eypert

Keywords:

Bandgap, Magnetron Sputtering, RBS, Refractive Index, Tantalum Oxynitride

Export:

RIS, BibTeX

Price:

Permissions CCC:

Request Permissions

Permissions PLS:

Request Permissions

Сopyright:

Citation:

References

[1] A.J. Waldorf, J.A. Dobrowolski, B.T. Sullivan, L.M. Plante, Appl. Opt. 32 (1993) 5583.

Google Scholar

[2] F. Rubio, J.M. Albella, J. Denis, J.M. Martinez-Duart, J. Vac. Sci. Technol. 21 (1982) 1043.

Google Scholar

[3] Chao-An Jong, Tsung Shune Chin, Materials Chemistry and Physics 74 (2002) 201.

Google Scholar

[4] H. Sorimachi, M. Tarashima, K. Sato, T. Ikeda,IEEE CHMT Symp. Proc. (1984) 110.

Google Scholar

[5] T. Oku, E. Kawakami, M. Uekubo, K. Takahiro, S. Yamaguchi, Appl. Surf. Sci. 99 (1996) 265.

Google Scholar

[6] K. Eda, T. Miwa, Y. Taguchi, T. Uwano, IEEE Trans. Microwave Technol. 38 (1990) 1949.

Google Scholar

[7] F. Vaz, P. Cerqueira, L. Rebouta, S.M.C. Nascimento, E. Alves, , Thin Solid Films (2004) 449.

Google Scholar

[8] S. Masahiko, H. Kazuhiko, O. Atsushi, US Patent US5786078 (1998).

Google Scholar

[9] M. Takayama, A. Noya, T. Sase, A. Ohta, K. Sasaki, Sci. Technol., B 14 (2) (1996) 674.

Google Scholar

[10] W.D. Sproul, D.J. Christ D.C. Carter, Thin Solid Films 491 (2005) 1.

Google Scholar

[11] J.H. Hsieh, C.C. Cheng, J.S Cheng, F.Y. Hsu, Thin Solid Films 517 (2009) 4711.

Google Scholar

[12] S.J. Henderson, A.L. Hector, journal Of Solid State Chemistry 179 (2006) 3518.

Google Scholar

[13] O. Banakh, P.A. Steinmann, L. Dumitrescu-Buforn, Thin Solid Films 513 (2006) 136.

DOI: 10.1016/j.tsf.2006.01.060

Google Scholar