The Effect of the Native Oxidation on the Characteristic of Surface Electron in the In0.13Al0.87N Epilayer Grown by MOCVD

Wei Zhou; Su Jing Xia; Xiang Li; Jie Yang; Wu Tang

doi:10.4028/www.scientific.net/AMR.335-336.655

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The Effect of the Native Oxidation on the Characteristic of Surface Electron in the In_0.13Al_0.87N Epilayer Grown by MOCVD

Abstract:

The property of surface electron in undoped IIn_0.13Al_0.87N epilayers with different thicknesses has been investigated using x-ray photoemission spectroscopy (XPS) and micro-Raman scattering spectra. XPS has been used to determine the characteristic of the native oxide at the free surfaces of In_0.13Al_0.87N film. It is showed that the binding energy shift to higher with the thickness reduction from the Al 2p, N 1s, In 3d_5/2 spectra. While, there is more native oxide at the surface of In_0.13Al_0.87N film with the decrease of thickness. In addition, a broad peak in high energy region was only observed in the thinnest In0.13Al0.87N epilayer from micro-Raman results, and it may be relative to L+ coupled mode of In0.13Al0.87N.