Volumetric Changes Between Different Conformations of Two SiOH Groups in SiO2 Glass

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Abstract:

We present numerical studies of possible modifications of SiOH groups in “wet” SiO2 glass with 193 nm laser irradiation. We focus on structural changes associated with two conformations: (i) two nearby hydrogen bonded SiOH groups, and (ii) oxygen triclusters, i.e. bridging oxygen forming a third covalent bond with a hydrogen atom. The energies of these two systems and the activation barrier of thermal relaxation between them identify the latter conformation as a candidate for a product formed under 193 nm laser exposure, when we consider the former conformation as an initial state. We investigate the effects of local volume changes associated with the changes in conformation and find it has non-negligible effect on the index of refraction. These conformational changes thus appear able to contribute to the permanent changes in index of refraction and absorption of the glass after UV irradiation.

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Periodical:

Advanced Materials Research (Volumes 39-40)

Pages:

89-92

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Online since:

April 2008

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© 2008 Trans Tech Publications Ltd. All Rights Reserved

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