High Saturation Magnetization Fe-Co-N Thin Film Deposited by Facing-Target Direct Current Magnetron Sputtering

Kai Yu Yang; Yin Han Gao; Cui Mei Zhao; Xin Wang; Wei Tao Zheng

doi:10.4028/www.scientific.net/AMR.415-417.1949

Paper Titles

Impedance Spectroscopy Analysis of p Type Li Doped ZnO Thin Film Effect
p.1925

Preparation of FePt Film via Electrochemical Deposition Method
p.1933

Corrosion Behavior of CrN/AlSiN Multilayer Coatings on AISI 304 Stainless Steel in Aluminum Alloy Melt
p.1938

Fabrication of TiO₂/Cu Composite Photocatalyst Thin Film by 2-Step Mechanical Coating Technique and its Photocatalytic Activity
p.1942

High Saturation Magnetization Fe-Co-N Thin Film Deposited by Facing-Target Direct Current Magnetron Sputtering
p.1949

Effects of the Substrates Temperatue and Argon Oxygen Ratio on ZnO Thin Films
p.1953

Resistivity Control in Unintentionally Doped GaN Films Grown on Si (111) Substrates by MOCVD
p.1959

XPS Study on Barium Strontium Titanate (BST) Thin Films Etching in SF₆/Ar Plasma
p.1964

Design and Synthesis of DLC Films with Different sp³/sp² Ratios by Middle Frequency Magnetron Sputtering
p.1969

HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 415-417High Saturation Magnetization Fe-Co-N Thin Film...

High Saturation Magnetization Fe-Co-N Thin Film Deposited by Facing-Target Direct Current Magnetron Sputtering

Abstract:

Magnetic materials have long been used for signal processing structures in the microwave range. High-frequency signal processing as for band-stop or notch filters, ferromagnetic resonance frequency can be adjusted or set by magnetic properties, such as saturation magnetization M_s. In this work, Fe-Co-N thin films have been synthesized using an improved facing-target magnetron sputtering system, where the sputtering current on Co and Fe targets can be regulated independently. During deposition of Fe-Co-N thin film, parameters on Fe target followed the one for synthesis of ε-Fe₃N, while changing the input current on Co target. It was found that on an unheated substrate, with the Co content of about 7 at.%, high value of M_s (265.08Am²kg^-1) could be obtained in the Fe-Co-N film, which contained α"-(Fe,Co)₁₆N₂ nanoparticles with the average size of 7 nm.