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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 433-440Fabrication and Characterization of Nanoscale...

Fabrication and Characterization of Nanoscale Porous Copper Film

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Abstract:

Cu-38Zn thin film (wt %) was deposited on the unheated microscope glass at the nanometer scale by DC magnetron sputtering. Subsequently, the nanocrystalline films were dealloyed in H2SO4 aqueous solution etching of zinc component, resulting in the formation of nanoscale porous copper film with average porous diameter of approximately 94 nm. The films microstructure and element composition were characterized by X-ray diffraction and scanning electron microscopy. The experimental results show that Cu-38Zn films are quasi-amorphous structure, porous copper film with different porous sizes is prepared by selective dissolution of zinc atoms from a nanocrystalline dual-phase film under free corrosion conditions, the grain size of the Cu-Zn films has an important effect on the dealloying process and the microstructures of the nanoscale copper films.

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Materials Science and Information Technology

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Periodical:

Advanced Materials Research (Volumes 433-440)

Pages:

683-688

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.433-440.683

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Online since:

January 2012

Authors:

Liu Wei Ding, Hao Ran Geng, Jing Hua Xu

Keywords:

Cu-Zn Alloy, Dealloying, Film, Magnetron Sputtering, Nano-Porous Copper

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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