Preparation and Characterization of Al-Mg-B Thin Films by Magnetron Sputtering

Abstract:

Hard and superlight thin films laminated with boron carbide have been proposed as candidates for strategic use such as armor materials in military and space applications. We prepared Al-Mg-B films by sputter deposition on Si (100) substrates with one AlMgB14 target. The films were characterized by X-ray diffraction, atomic force microscope, GD-OES spectroscopy. The results show that films of AlMgB with different compositions have been deposited by changing the target power and deposition temperature.The influences of substrate temperature and sputtering power on the quality of the films are discussed.

• Periodical: Advanced Materials Research (Volume 465)
• Pages: 112-117
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.465.112
• Online since: February 2012
• Authors: Wen Liu, Qing Sen Meng, Yang Miao, Feng Hua Chen, Li Fang Hu
• Keywords: Al-Mg-B Thin Films, Magnetron Sputtering, Sputtering Power, Substrate Temperature

References

[1] Higashi I, Kobayashi M, Okada S, Hamano K, Lundstrom T. Boron-rich crystals in Al–M–B (M = Li, Be, Mg) systems grown from high-temperature aluminum solutions.J Cryst Growth.128(1993)1113-1119.

DOI: 10.1016/s0022-0248(07)80108-4

[2] Cook B A, Harringa J L, Lewis TL, Russell AM. A NEW CLASS OF ULTRA-HARD MATERIALS BASED ON AlMgB14. Scr Mater. 42(2000)597-602.

DOI: 10.1016/s1359-6462(99)00400-5

[3] Teter DM. MRS Bull. COMPUTATIONAL ALCHEMY: THE SEARCH FOR NEW SUPERHARD MATERIALS.23(1998)22-27

DOI: 10.1557/s0883769400031420

[4] Matkovich VI, Economy J. J Acta Crystallogr B Structure of MgAlB14 and a brief critique of structural relationships in higher borides.26(1970)616-621.

DOI: 10.1107/s0567740870002868

[5] Russell A M, Cook B A, Harringa J L, Lewis T L. Coefficient of thermal expansion of AlMgB14.Scripta Mater .46 (2002) 629–633

DOI: 10.1016/s1359-6462(02)00034-9

[6] Takeda M, Fukuda T, Domingo F, Miura T. Thermoelectric properties of some metal borides. J Solid State Chem 177(2004)471–475.

DOI: 10.1016/j.jssc.2003.02.005

[7] Bairamashvili IA, Kekelidze LI, Golikova OA, Orlov VM. J Less Common Met 1979;67:461.

[8] Cherukuri R, Womack M, Molian P, Russell A, Tian Y. Surf Coat Technol 2002;155:112.

[9] Tian Y, Bastawros AF, Lo CCH, Constant AP, Russell AM, Cook BA. Superhard self-lubricating AlMgB14 films for microelectromechanical devices. Appl Phys Lett .83(2003)2781–2783.

DOI: 10.1063/1.1615677

[10] Tian Y, Constant A, Lo CCH, Anderegg JW, Russell AM, Snyder JE, et al.Microstructure evolution of Al–Mg–B thin films by thermal annealing .Vac SciTechnol A. 21(2003)1055-1064.

DOI: 10.1116/1.1586274

[11] Tian Y, Womack M, Molian P, Lobb CCH, Anderegg JW, Russell AM. Microstructure and nanomechanical properties of Al–Mg–B–Ti films synthesized by pulsed laser deposition.Thin Solid Films.418(2002)129-135

DOI: 10.1016/s0040-6090(02)00766-6

[12] Tian Y, Li G, Shinar J, Wang NL, Cook BA, Anderegg JW, et al. Electrical transport in amorphous semiconducting AlMgB14 films.Appl Phys Lett.85(2004)1181-1184.

DOI: 10.1063/1.1781738

[13] Yan C, Zhou ZF, Chong YM, Liu CP, Liu ZT, Li KY, et al. Synthesis and characterization of hard ternary AlMgB composite films prepared by sputter deposition.Thin Solid Films. 518(2010)5372-5378.

DOI: 10.1016/j.tsf.2010.03.038

[14] Wu Z, ,Yizhen Bai , Wenchao Qu, et al. Al-Mg-B thin films prepared by magnetron sputtering, Vacuum (2010)1-5.

DOI: 10.1016/j.vacuum.2010.09.004

[15] B.P. Singh,G. Srivastava R.C. Mehrotra.Journal of Organometallic Chemistry. Synthesis and reactions of triorganotin dialkyldithiophosphates.171 (1979)35 -41

DOI: 10.1016/s0022-328x(00)88061-4