A Study of the Solid-State Reaction for Polishing Sapphires

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Abstract:

As sapphire is an important substrate material, stringent surface quality requirements (i.e., surface finish and flatness) are required. In order to acquire the higher material removal rate and the better surface quality of sapphire, the solid state-reaction were introduced in this paper; abrasive of SiO2 and SiO2 with mixing the MgF2 power were compared to polish sapphire. The result showed that abrasive of SiO2 with mixing the MgF2 can obtain higher material removal rate and better surface quality. The result of the pr

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195-199

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April 2012

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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