CVD Diamond Film Polishing Based on Accelerant Theory

Li Zhang; Shao Jie Ding; Dong Hui Wen; Zhen Hao Xu; Shi Ming Ji

doi:10.4028/www.scientific.net/AMR.497.185

Paper Titles

Simulation of Large Scale KDP Crystal Polishing by Computer Controlled Micro-Nano Deliquescence
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Study of Magnetorheological Brush Finishing (MRBF) for Concave Surface of Conformal Optics
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The Composite Ultra-Precision Processing Technology for the Small Aspheric Mould of Stainless Steel
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Analyze and Verify Cutting Depth Distribution of Different Grits Size SFAP
p.180

CVD Diamond Film Polishing Based on Accelerant Theory
p.185

A New Method for Free Surface Polishing Based on Soft-Consolidation Abrasive Pneumatic Wheel
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A Study of the Solid-State Reaction for Polishing Sapphires
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Study on Polishing Technology of GaAs Wafer
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New Researches for Fabrication of Micro-Pin in Micro-ECM
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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 497CVD Diamond Film Polishing Based on Accelerant...

CVD Diamond Film Polishing Based on Accelerant Theory

Abstract:

CVD diamond has become the mainstream trend for the development of diamond. Its ultra precision machining is one of the key technologies for expanding the application of CVD diamond film. The efficient polishing method is studied, called accelerant polishing technology, which can lower the activation energy needed in diamond graphitization by the accelerant action of transition metal. It accelerates reaction rates of graphitization and promotes the implementation of diamond’s removal mechanism. Experimentation results indicate that the polishing method is one new type of precision polishing technology with low cost and high efficiency.

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Periodical:

Advanced Materials Research (Volume 497)

Pages:

185-189

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.497.185

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Online since:

April 2012

Authors:

Li Zhang, Shao Jie Ding, Dong Hui Wen, Zhen Hao Xu, Shi Ming Ji

Keywords:

Accelerant Action, CVD Diamond Film, Polishing

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