Research on CrN-Based Ternary Films Deposited by Magnetron Sputtering

Yue Lan Di; Zhi Hai Cai; Ping Zhang; Wei Shen

doi:10.4028/www.scientific.net/AMR.557-559.1650

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 557-559Research on CrN-Based Ternary Films Deposited by...

Research on CrN-Based Ternary Films Deposited by Magnetron Sputtering

Abstract:

Different Mo content of ternary Cr-Mo-N films were deposited on steel substrates using closed-field unbalanced magnetron sputtering technique using Cr target and Mo target in N2/Ar gaseous mixture. The composition, structure, surface morphology and valence states of ternary CrMoN films were tested by EDS, XRD, SEM and XPS respectively. The experimental results showed that the preferential growth orientation of CrMoN films was changed from CrN (220) to (200) after the addition of Mo element. The diffraction peak shifted leftwards as a function of Mo content, The synthesized CrMoN coatings formed a substitutional solid solution of (Cr,Mo)N where larger Mo atoms replaced Cr in CrN crystal. The mechanical property experiments were carried out on the nanotest 600 hardness-testing device. The hardness of CrMoN films enhanced for the synergistic effect of CrN and MoN hard phases

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Advanced Materials Research (Volumes 557-559)

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1650-1653

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.557-559.1650

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Online since:

July 2012

Authors:

Yue Lan Di, Zhi Hai Cai, Ping Zhang, Wei Shen

Keywords:

Closed-Field Unbalanced Magnetron Sputtering Technique, CrMoN Coatings, Hardness, Microstructure

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