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Quantification of the N2+ Implanted AES Depth Profiles in Cobalt Films

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Abstract:

The nitrogen implanted profiles in cobalt films that are generated by N2+ bombardment with three energies of 0.5, 2.0 and 5.0 keV are simulated by the analytical Schulz-Wittmaack expression and the SRIM program, respectively. Taking the both simulated profiles as concentration-depth profiles, the corresponding measured AES depth profiling data of implanted nitrogen are perfectly fitted by the Mixing-Roughness-Information depth (MRI) model.

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Periodical:

Advanced Materials Research (Volumes 557-559)

Pages:

1635-1640

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.557-559.1635

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Online since:

July 2012

Authors:

Yi Liu, Jiang Yong Wang, Siegfried Hofmann, Janez Kovac

Keywords:

Implantation Profile, Mri Model, Schulz-Wittmaack Expression, SRIM Program

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© 2012 Trans Tech Publications Ltd. All Rights Reserved

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