Microstructural and Magnetic Properties of C/FePt/Ti Films by Facing Sputtering

Abstract:

C/FePt/Ti nano-thin films were prepared by DC facing-target magnetron sputtering system onto glass substrates at room temperature and subsequently in situ annealed for 500 °C 30 min in vacuum. The influence of C capping layer on microstructural and magnetic properties of the FePt films were investigated in detail. Atomic force microscopy (AFM) images indicate that C can effectively isolate the particles, refine particle, and distribute; however, the particle size distribution is uneven for too much C. The easy magnetic axial orientation is changed with the C layer thickness.

• Periodical: Advanced Materials Research (Volumes 557-559)
• Pages: 1787-1790
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.557-559.1787
• Online since: July 2012
• Authors: Jia Ling Xu, Li Yun Jia, Hong Fan
• Keywords: FePt, L10, Magnetic Films, Magnetron Sputtering

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