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Large-Scale Molecular Dynamics Modeling of a-SiO2

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Abstract:

Silicon dioxide plays an important role in integrated circuits and microelectronics. However, the experiments have limitations in micro/nano-scale characterization of fracture properties at high temperatures. In this paper, the structural and fracture properties of amorphous silicon dioxide (a-SiO2) were studied at temperatures up to 1500K. The simulation results consist with the experiments on pair distribution functions, structure factor and angular distributions.

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Periodical:

Advanced Materials Research (Volumes 602-604)

Pages:

751-754

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.602-604.751

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Online since:

December 2012

Authors:

Ning Bo Liao

Keywords:

Amorphous Structure, Molecular Dynamic (MD), Silicon Dioxide

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© 2013 Trans Tech Publications Ltd. All Rights Reserved

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