Sensitivity of ZnO Based NH₃ Sensor by RF Magnetron Sputtering

Abstract:

Zinc Oxide (ZnO) thin films were deposited onto SiO₂/Si substrates using radio frequency (RF) magnetron sputtering method as an Ammonia (NH₃) sensor. The dependence of RF power (50~300 Watt) on the structural properties and sensitivity of NH₃ sensor were investigated. XRD analysis shows that regardless of the RF power, all samples display the preferred orientation on the (002) plane. The results show that the ZnO deposited at 200 Watt display the highest sensitivity value which is 44%.

• Periodical: Advanced Materials Research (Volume 626)
• Pages: 168-172
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.626.168
• Online since: December 2012
• Authors: Samsiah Ahmad, Nor Diyana Md Sin, M.N. Berhan, Mohamad Rusop
• Keywords: Ammonia, Magnetron Sputtering, RF Power, Sensitivity, Zinc Oxide (ZnO)

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