Characterization of Interfacial Layer of DUV Coatings by Spectroscopic Ellipsometry

Article Preview

Abstract:

The Interfacial layer has an important influence on the optical performance of the deep ultraviolet (DUV) coatings. The variable angle Spectroscopic ellipsometry measurements of three kinds of DUV coating samples were performed in the wavelength range 150-500nm using a purged variable angle Spectroscopic ellipsometer. The samples include the single layer sample, double layers sample, and three layers sample. The thickness and optical index of the MgF2 layer and LaF3 layer as well as those of the interfacial layer between them were obtained by successful regression of the SE measurements. For the single layer, the agreement of the results between the SE and the spectrophotometic techniques was very good. The obtained thickness of the two kinds of interfacial layer was in consistent with the RMS results of the single layer obtained by AFM, indicating the obtained results were reliable.

You might also be interested in these eBooks

Info:

Periodical:

Pages:

277-283

Citation:

Online since:

February 2013

Authors:

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2013 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation:

[1] D. Basting, G. Marowsky. Excimer laser technology, (Springer, 2005).

Google Scholar

[2] Koji Kakizaki, Yoichi Sasaki, and Toyoharu Inoue. High-repetition-rate, 6 kHz and long-pulse-duration, 50 ns ArFexcimer laser for sub-65 nm lithography [J]. REVIEW OF SCIENTIFIC INSTRUMENTS, 77, 035109(2006).

DOI: 10.1063/1.2182744

Google Scholar

[3] C. Zaczek, S. Müllender, H. Enkisch, F. Bijkerk. Coatings for next generation lithography. Proc. of SPIE Vol. 7101: 71010X-1.

DOI: 10.1117/12.796944

Google Scholar

[4] V. Liberman, M. Rothschild, J. H. C. Sedlacek, R. S. Uttaro. Marathon Testing of Optical Materials for 193-nm Lithographic Applications. Proc SPIE 3578, 1(1998).

DOI: 10.1117/12.344432

Google Scholar

[5] A. Duparre, R. Thielsch, N. Kaiser, S. Jakobs, K. R. Mann, and E. Eva. Surface finish and optical quality of CaF2 for UV lithography applications. Proc SPIE 3334, 1048 (1998).

DOI: 10.1117/12.310735

Google Scholar

[6] Oliver Apel, Michael Schulz-Grosser, Uwe Leinhos, MichaelKennedy, Klaus Mann, Rainer Schuhmann. Interfacial absorption of DUV coatings. SPIE Vol. 4347 (2001)17-23.

DOI: 10.1117/12.425030

Google Scholar

[7] T. Yamaguchi, H. Tamura,S. Taga, S. Tsuchiya, App Opt. Vol. 25, No. 16: 2703-2706 (1986).

Google Scholar

[8] W. Arens, D. Ristau, J. Ullmann, C. Zaczek, R. Thielsch, N. Kaiser, A. Duparre, 0. Apel, K. Mann, H. Lauth, H. Bernitzki, J. Ebert, St. Schippel, H. Heyer. Proc. SPIE 3902, 250-258 (2000).

DOI: 10.1117/12.379314

Google Scholar

[9] B. C. Li, S. Martin, E. Welsch, R. Thielsch, J. Heber and N. Kaiser,. Proc. SPIE 3902, 470-479 (2000).

Google Scholar

[10] James N. Hilfiker, Neha Singh, Tom Tiwald, Diana Convey, Steven M. Smith, Jeffrey H. Baker. Survey of methods to characterize thin absorbing films with Spectroscopic Ellipsometry. Thin Solid Films 516 (2008) 7979 –7989.

DOI: 10.1016/j.tsf.2008.04.060

Google Scholar

[11] H.G. Tompkins, E.A. Irene (Eds. ), Handbook of Ellipsometry, William Andrew Publishing, Norwich NY, (2005).

Google Scholar

[12] H. Fujiwara, Spectroscopic Ellipsometry Principles and Applications, John Optical Wiley & Sons Ltd, West Sussex, England, (2007).

Google Scholar

[13] R.M.A. Azzam, N.M. Bashara, Ellipsometry and Polarized Light, Elsevier Science B.V., Amsterdam, the Netherlands, (1977).

Google Scholar

[14] H.G. Tompkins, W.A. McGahan, Spectroscopic Ellipsometry and Reflecto metry: A User's Guide, John Wiley & Sons Inc., New-York NY, (1999).

Google Scholar

[15] G.E. Jellison, in: H.G. Tompkins, E.A. Irene (Eds. ), Handbook of Ellipsometry, William Andrew Publishing, Norwich NY, 2005, p.262.

Google Scholar