Characterization of TiO2 Thin Films Deposited by SILAR Method

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SILAR method is adopted for the deposition of titanium dioxide (TiO2) thin films. Titanium trichloride and ammonium hydroxide are used as the cationic and anionic precursors respectively. Deposition parameters such as growth rate, individual dipping and rinsing times and precursor concentration are optimized to obtain uniform, adherent films. As-deposited TiO2 films are annealed at 300°C and 400° C. The crystallization behaviour of TiO2 thin films is analysed by X-ray diffraction. Optical constants of the films are evaluated using UV-Vis spectrophotometry. Effect of deposition parameters on the optical properties of the films is analysed.The direct and indirect band gap values of the TiO2 thin films is in the range of 3.4-3.8 eV and 2.1-3.8 eV respectively.

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March 2013

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[1] B.O' Regan, M. Gratzel, Nature 353(1991)737

Google Scholar

[2] M.Anpo, M.Takeuchi, J.Catal. 216(2003)503

Google Scholar

[3] A.M. More, Applied Surface Science 255(2009)6067

Google Scholar

[4] M.Okada, M.Tazawa,P.Jin,Y.Yamada,K.Yoshimura,Vacuum, 80(2006)732

Google Scholar

[5] A.M. More, J.L. Gunjakar, C.D. Lokhande, Sens. Actuators,B:Chem.129(2008)671

Google Scholar

[6] P.S. Peercy, Nature, 406(2000)1023

Google Scholar

[7] C.Euvananont, C.Junin, K.Inpor, P.Limthongkul, C.Thanachayanont, Ceramics International, 34(2008)1067

DOI: 10.1016/j.ceramint.2007.09.043

Google Scholar

[8] C.D. Lokhande, E.H. Lee, K.D. Jung, O.S. Joo, J.Mater. Sci. 39(2004)2915

Google Scholar

[9] S.Karuppuchamy, N.Suzuki, S.Ito, T.Endo, Current Applied Physics 2(2009)243-248

Google Scholar

[10] J.C. Plenet, A.Brioude, E.Bernstein, F.Lequevre, J.Dumas, J.Mugnier, Optical materials 13(2004)2915

DOI: 10.1016/s0925-3467(99)00094-4

Google Scholar

[11] Arturo I Martinez, Dwight R Acosta, Alcides A Lopez, J. Phys.Condens. Matter 16(2004)S2335

Google Scholar

[12] P. Zeman, S.Takabayashi, Surf. Coat. Technol. 153(2002)93

Google Scholar

[13] C.Natarajan, N.Fukunada, G.Nogami, thin Solid Films 322 (1998)6

Google Scholar

[14] S.S. Kale, R.S. Mane, Hoeil Chung, Moon-Young Yoon, C.D. Lokhande, Sung-Hwan Han, Applied Surface Science, 253(2006)421

Google Scholar

[15] Y.Takabhashi, H.Suzuki, M.Nasu, J.Chem.Soc., Faraday Trans. 181(1985) 317

Google Scholar

[16] Li-Jian Meng, M.P.dos Santos, Thin Solid Films, 226(1993)22

Google Scholar

[17] G.A. Battiston, Thin Solid Films 371(2000)126

Google Scholar

[18] H.M. Pathan, C.D. Lakhande, Bulletin of Material Science, 27(2004)85

Google Scholar

[19] M.Hemissi, H.Amardjia-Adanani, Digest Journal of Nanomaterials and Biostructures 2(2007) 299

Google Scholar

[20] S.Subramanian, P.Chitra lekha, D.Pathinettam Padiyam, Current Applied Physics, 9, (2009)1140

Google Scholar

[21] J.Tauc, R.Grigorovici, A.Vancu, Phys. Status Solidi, 15, (1966)627

Google Scholar

[22] M. M. Hasan, A. S. M. A. Haseeb, R. Saidur, and H. H. Masjuki, International Journal of Chemical and Biological Engineering, 2,(2008)96

Google Scholar