Observation in the Surface Roughness of Silicon Wafer during Semi-Fixed Abrasive Machining with Large Grains
Semi-fixed abrasive is a novel abrasive. It has a ‘trap’ effect on the hard large grains that can prevent defect effectively on the surface of the workpiece which is caused by large grains. In this paper, some relevant experiments towards silicon wafers are carried out under the different processing parameters on the semi-fixed abrasive plates, and 180# SiC is used as large grains. The processed workpieces’ surface roughness Rv are measured. The experimental results show that the surface quality of wafer will be worse because of higher load and faster rotating velocity. And it can make a conclusion that the higher proportion of bond of the plate, the weaker of the ‘trap’ effect it has. Furthermore the wet environment is better than dry for the wafer surface in machining. The practice shows that the ‘trap’ effect is failure when the workpiece is machined by abrasive plate which is 4.5wt% proportion of bond in dry lapping.
Julong Yuan, Shiming Ji, Donghui Wen and Ming Chen
P. Zhao et al., "Observation in the Surface Roughness of Silicon Wafer during Semi-Fixed Abrasive Machining with Large Grains", Advanced Materials Research, Vols. 69-70, pp. 253-257, 2009