The Slurry for Glass Polishing by Micro Abrasive Suspension Jets

Abstract:

Article Preview

The influence of different dispersants and suspending agents of CeO2 polishing powder was investigated, including sodium hexametaphosphate, polyethyleneglycoll, polyacrylic acid, anionic polyacrylamide, and their mixtures. The suspension stability of ceria particles in slurries and the pH dependence were examined by the measurement of zeta potential, sedimentation and viscosity, etc. The material removal rate and surface roughness of different slurries for K9 glass polishing were studied. The slurry mixed by three kinds of dispersants can achieved the maximum material removal rate and the minimum surface roughness.

Info:

Periodical:

Advanced Materials Research (Volumes 69-70)

Edited by:

Julong Yuan, Shiming Ji, Donghui Wen and Ming Chen

Pages:

322-327

DOI:

10.4028/www.scientific.net/AMR.69-70.322

Citation:

Y. P. Liao et al., "The Slurry for Glass Polishing by Micro Abrasive Suspension Jets", Advanced Materials Research, Vols. 69-70, pp. 322-327, 2009

Online since:

May 2009

Export:

Price:

$35.00

In order to see related information, you need to Login.

In order to see related information, you need to Login.