The Slurry for Glass Polishing by Micro Abrasive Suspension Jets
The influence of different dispersants and suspending agents of CeO2 polishing powder was investigated, including sodium hexametaphosphate, polyethyleneglycoll, polyacrylic acid, anionic polyacrylamide, and their mixtures. The suspension stability of ceria particles in slurries and the pH dependence were examined by the measurement of zeta potential, sedimentation and viscosity, etc. The material removal rate and surface roughness of different slurries for K9 glass polishing were studied. The slurry mixed by three kinds of dispersants can achieved the maximum material removal rate and the minimum surface roughness.
Julong Yuan, Shiming Ji, Donghui Wen and Ming Chen
Y. P. Liao et al., "The Slurry for Glass Polishing by Micro Abrasive Suspension Jets", Advanced Materials Research, Vols. 69-70, pp. 322-327, 2009