The Slurry for Glass Polishing by Micro Abrasive Suspension Jets

Article Preview

Abstract:

The influence of different dispersants and suspending agents of CeO2 polishing powder was investigated, including sodium hexametaphosphate, polyethyleneglycoll, polyacrylic acid, anionic polyacrylamide, and their mixtures. The suspension stability of ceria particles in slurries and the pH dependence were examined by the measurement of zeta potential, sedimentation and viscosity, etc. The material removal rate and surface roughness of different slurries for K9 glass polishing were studied. The slurry mixed by three kinds of dispersants can achieved the maximum material removal rate and the minimum surface roughness.

You might also be interested in these eBooks

Info:

Periodical:

Advanced Materials Research (Volumes 69-70)

Pages:

322-327

Citation:

Online since:

May 2009

Export:

Price:

Permissions CCC:

Permissions PLS:

Сopyright:

© 2009 Trans Tech Publications Ltd. All Rights Reserved

Share:

Citation: