High Temperature Oxidation of CrAlSiN Thin Films

Sung Bin Won; Min Jung Kim; Chun Yu Xu; Yeon Sang Hwang; Dong Bok Lee

doi:10.4028/www.scientific.net/AMR.699.612

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HomeAdvanced Materials ResearchAdvanced Materials Research Vol. 699High Temperature Oxidation of CrAlSiN Thin Films

High Temperature Oxidation of CrAlSiN Thin Films

Abstract:

Nano-multilayered, crystalline CrAlSiN thin films were deposited on either steel or WC-10%Co substrates by the cathodic arc plasma deposition. Their oxidation characteristics were studied at 800-1000°C for 50 h in air. The film deposited on steel displayed good oxidation resistance, due mainly to formation of Cr2O3 and α-Al2O3. The film deposited on WC-10%Co displayed poor oxidation resistance, due mainly to the oxidation of the substrate.