[1]
G. Mula, C. Adelmann, S. Moehl, J. Oullier, and B. Daudin: Phys. Rev. B Vol. 64 (2001), p.195406.
Google Scholar
[2]
B. Heying, R. Averbeck, L. F. Chen, and E. Haus: J. Appl. Phys. Vol. 88(2000), p.1855.
Google Scholar
[3]
C. Adelmann, J. Brault, G. Mula, B. Daudin, L. Lymperakis, and J. Neugebauer: Phys. Rev. B Vol. 67 (2003), p.165419.
DOI: 10.1103/physrevb.67.165419
Google Scholar
[4]
G. Koblmüller, R. Averbeck, H. Riechert, and P. Pongratz: Phys. Rev. B Vol. 69 (2004), p.035325.
Google Scholar
[5]
H. Morkoc, S. Strite, G.B. Gao, M.E. Lin, B. Sverdlov and M. Burns: J. Appl. Phys. Vol. 76 (1994), p.1363.
Google Scholar
[6]
N.M. Johnson, A.V. Nurmikko and S.P. DenBaars: Phys. Today Vol. 53 (2000), p.31.
Google Scholar
[7]
S.C. Jain, M. Willander, J. Narayan and R. V. Overstraeten: J. Appl. Phys. Vol. 87 (2000), p.965.
Google Scholar
[8]
P. J. Hansen, L. Shen, Y. Wu, A. Stonas, Y. Terao, S. Heikman, D. Buttari,T. R. Taylor, S. P. DenBaars, U. K. Mishra, R. A. York, and J. S. Speck: J. Vac. Sci. Technol. B Vol. 22(2004), p.2479.
DOI: 10.1116/1.1800352
Google Scholar
[9]
I. Stolichnov, L. Malin, P. Muralt, and N. Setter: Appl. Phys. Lett. Vol. 88(2006), p.043512.
DOI: 10.1063/1.2168506
Google Scholar
[10]
H. Wu, J. Yuan, T. Peng, Y. Pan, T. Han, and C. Liu: Appl. Phys. Lett. Vol. 94(2009), p.122904.
Google Scholar
[11]
G. Mula, C. Adelmann, S. Moehl, J. Oullier, and B. Daudin: Phys. Rev. B Vol. 64(2001), 195406.
Google Scholar
[12]
B. Heying, R. Averbeck, L. F. Chen, E. Haus, H. Riechert, and J.S. Speck: J. Appl. Phys. Vol. 88(2000), p.1855.
Google Scholar
[13]
C. Adelmann, J. Brault, G. Mula, B. Daudin, L. Lymperakis, and J. Neugebauer: Phys. Rev. B Vol. 67 (2003), 165419.
DOI: 10.1103/physrevb.67.165419
Google Scholar
[14]
G. Koblmüller, R. Averbeck, H. Riechert, and P. Pongratz: Phys. Rev. B Vol. 69(2004), p.035325.
Google Scholar
[15]
O. Ambacher: J. Phys. D Vol. 31(1998), p.2653.
Google Scholar
[16]
W.B. Luo, J. Zhu, H. Chen X.P. Wang, Y. Zhang and Y.R. Li: J. Appl. Phys. Vol. 106 (2009) , p.104120.
Google Scholar
[17]
W.B. Luo, The Epitaxial Growth and Properties of Dielectric Oxide Films on GaN Semiconductors, Chengdu, University of Electronic Science and Technology of China, 20109(in Chinese).
Google Scholar
[18]
P. Huang and C. Yang: Acta phys. Sin. Vol. 60(2011), p.106801(in Chinese).
Google Scholar
[19]
A.L. Rosa and J. Neugebauer: Phys. Rev.B. Vol. 73 (2006), p.205346.
Google Scholar