A Study of ITO Thin Films Fabricated by DC Magnetron Sputtering Method

Xian Ming Yang; Lin Liu; Juan Xiu Lin

doi:10.4028/www.scientific.net/AMR.834-836.79

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HomeAdvanced Materials ResearchAdvanced Materials Research Vols. 834-836A Study of ITO Thin Films Fabricated by DC...

A Study of ITO Thin Films Fabricated by DC Magnetron Sputtering Method

Abstract:

With high optical transparency and electrical conductivity, ITO thin films were fabricated by DC magnetron sputtering. Based on orthogonal test table L18 (35), the effects of process parameters included water partial pressure, work pressure, substrate temperature, oxygen flow rate and sputtering power, on the optoelectronics properties of ITO thin films were investigated in detail(systematically). Calibration of sheet resistance transmittance, atomic force microscope, and X-ray diffraction were employed to characterize the ITO films.

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Periodical:

Advanced Materials Research (Volumes 834-836)

Pages:

79-89

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.834-836.79

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Online since:

October 2013

Authors:

Xian Ming Yang*, Lin Liu, Juan Xiu Lin

Keywords:

DC Magnetron Sputtering, ITO Thin Films, Orthogonal Test, Process Parameter

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