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Optical Properties of Black Silicon Using the Combination Method of KOH and Gold-Assisted HF Etching

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Abstract:

A kind of hill-like black silicon have been designed and fabricated by using the combination method of KOH anisotropic etching and gold-assisted HF etching. Pillars array on the surface of a silicon sample was obtained by KOH etching with a SiNx film dots pattern used as a mask. The sample was then etched in the oxidant HF solution catalyzed by Au nanoparticles for 5 minutes. The etched sample appears dark black. This black silicon is orderly hill-like textures in micro-scale with density nanopores on them. It can suppress the reflection to less than 4% in wavelength range from 250nm to 1000nm, and to about 2.5% at the wave number of 2000-4000 cm-1. It also has high additional absorption in IR range.

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Periodical:

Advanced Materials Research (Volume 918)

Pages:

42-46

DOI:

https://doi.org/10.4028/www.scientific.net/AMR.918.42

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Online since:

April 2014

Authors:

Guo Dong Zhao*, Xing Hua Zhu, You Yu, Xiao Lin Zheng

Keywords:

Black Silicon, Metal-Assisted Etching, Microstructure, Wet Etching

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© 2014 Trans Tech Publications Ltd. All Rights Reserved

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