Influence of Sputtering Power on the Properties of CdS Thin Films Deposited by Magnetron Sputtering

Abstract:

CdS films were prepared with different sputtering power by radio frequency magnetron sputtering from CdS slices target. The structural and physical properties of CdS films were studied using X-ray diffraction (XRD), atomic force microscopy (AFM), ultraviolet spectrophotometer and Hall effect measurements. The results of structural analysis showed that CdS films are polycrystalline with a cubic structure having (1 1 1) plane and a hexagonal structure having (0 0 2) plane. AFM micrographs show that the grain size increases with the sputtering power increasing. The optical transmission data indicate that all CdS films have high optical transmittance. In Hall Effect measurements, the electrical resistivity of the deposited films are 3.2x10³Ω·cm, 1.5x10⁴Ω and 2.2x10⁴Ω·cm, respectively.

• Periodical: Advanced Materials Research (Volumes 941-944)
• Pages: 1293-1297
• DOI: https://doi.org/10.4028/www.scientific.net/AMR.941-944.1293
• Online since: June 2014
• Authors: Wan Liu, Dong Mei Zeng, Huan Gao, Yin Yin Mu, Yun Zeng, Wei Guang Liu
• Keywords: Cds Film, Magnetron Sputtering, Sputtering Power

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