Fabrication and Morphological Stability of Aluminium Nanostructures En Route to Nanopatterned Sapphire
It has recently been demonstrated that it is possible to produce a pristine surface layer on a lapped sapphire substrate by depositing a thin film of aluminum and subjecting it to an appropriate thermal treatment. This process also shows promise for the fabrication of nanopatterned sapphire by pre-patterning the aluminum metal prior to thermal conversion to sapphire. We have explored two distinct patterning processes: a dual layer photoresist e-beam lithography technique for fabricating arbitrarily shaped aluminum structures, and a novel, non-conventional mask-liftoff method involving nanoporous anodized aluminum oxide, useful for patterning very large scale arrays of sub-micron aluminum dots or posts. Our work is focused on refining the fabrication process and investigating the morphological stability of such metal nanostructures during conversion to sapphire.
J. M. Biser et al., "Fabrication and Morphological Stability of Aluminium Nanostructures En Route to Nanopatterned Sapphire ", Advances in Science and Technology, Vol. 45, pp. 945-950, 2006