Metal-Organic Chemical Vapor Deposition of BiFeO₃ Based Multiferroics

Abstract:

BiFeO₃ films undoped and doped with Ba and/or Ti have been fabricated through Metal-Organic Chemical Vapor Deposition (MOCVD) on SrTiO₃ (100), SrTiO₃:Nb (100) and YSZ (100) substrates. Films have been deposited using a multi-metal source, consisting of the Bi (phenyl)₃, Fe (tmhd)₃, Ba (hfa)₂•tetraglyme and Ti (tmhd)₂(O-iPr)₂ (phenyl= -C₆H₅, H-tmhd=2,2,6,6-tetramethyl-3,5-heptandione; O-iPr= iso-propoxide; H-hfa=1,1,1,5,5,5-hexafluoro-2,4-pentanedione; tetraglyme = CH₃O(CH₂CH₂O)₄CH₃) precursor mixture. The structural and morphological characterization of films has been carried out using X-ray diffraction (XRD) and field emission scanning electron microscopy (FE-SEM). Chemical compositional studies have been performed by energy dispersive X-ray (EDX) analysis. Structural and morphological characterizations point to the formation of crystalline phases and homogeneous surfaces for both undoped and doped BiFeO₃ films. Piezoresponse force microscopy (PFM) and piezoresponce force spectroscopy (PFS) have been applied to study the piezoelectric and ferroelectric properties of the films.

• Periodical: Advances in Science and Technology (Volume 90)
• Pages: 57-65
• DOI: https://doi.org/10.4028/www.scientific.net/AST.90.57
• Online since: October 2014
• Authors: Maria Rita Catalano, Gugliemo Guido Condorelli, Raffaella Lo Nigro, Graziella Malandrino*
• Keywords: BiFeO₃, MOCVD, Multiferroic Thin Films, PFM, Pole Figures

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