Diffusion and Surface Segregation in Thin SiGe/Si Layers Studied by Scanning Transmission Electron Microscopy

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Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Edited by:

H. Mehrer, Chr. Herzig, N.A. Stolwijk, H. Bracht

Pages:

1135-1140

DOI:

10.4028/www.scientific.net/DDF.143-147.1135

Citation:

T. Walther et al., "Diffusion and Surface Segregation in Thin SiGe/Si Layers Studied by Scanning Transmission Electron Microscopy", Defect and Diffusion Forum, Vols. 143-147, pp. 1135-1140, 1997

Online since:

January 1997

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$35.00

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