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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 143-147Complex Diffusive Processes in Silicon

Complex Diffusive Processes in Silicon

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Diffusion in Materials DIMAT 1996

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Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Pages:

971-978

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.143-147.971

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Online since:

January 1997

Authors:

Sokrates T. Pantelides, M. Ramamoorthy, A. Maiti, M.F. Chisholm, S.J. Pennycook

Keywords:

As-Vacancy Complexes, First-Principle Calculations, Grain Boundary Segregation, Heavy Doping, Si:As, Silicon Oxide (SiO)

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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