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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 143-147Fast Metal Diffusion in Silicon under Intrinsic...

Fast Metal Diffusion in Silicon under Intrinsic and Extrinsic Doping Conditions

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Diffusion in Materials DIMAT 1996

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Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Pages:

979-992

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.143-147.979

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Online since:

January 1997

Authors:

Hartmut Bracht

Keywords:

Diffusion, Fermi Level Effect, Gold, Kick-Out Mechanism, Radiotracer, Self-Interstitial, Silicon, Spreading Resistance, Zinc

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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