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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 143-147Short-Time Diffusion of Aluminium in Silicon and...

Short-Time Diffusion of Aluminium in Silicon and Co-Diffusion with Phosphorus and Boron

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Diffusion in Materials DIMAT 1996

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Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Pages:

1009-1014

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.143-147.1009

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Cite this paper

Online since:

January 1997

Authors:

U. Kuhlmann, D. Nagel, R. Sittig

Keywords:

Aluminum (Al), Boron, Diffusion, Fermi Level Effect, Field-Assisted Diffusion, Ion-Pairing, Kink-and-Tail, Phosphorus, Rapid Thermal Processing, Self-Interstitial, Silicon

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© 1997 Trans Tech Publications Ltd. All Rights Reserved

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