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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 143-147Quantum-Well Boron and Phosphorus Diffusion...

Quantum-Well Boron and Phosphorus Diffusion Profiles in Silicon

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Diffusion in Materials DIMAT 1996

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Periodical:

Defect and Diffusion Forum (Volumes 143-147)

Pages:

1003-1008

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.143-147.1003

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Online since:

January 1997

Authors:

Nikolai T. Bagraev, W. Gehlhoff, L.E. Klyachkin, A. Näser, S.A. Rykov

Keywords:

Impurity Diffusion, Silicon, Surface Injection of Self-Interstitials and Vacancies

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Сopyright:

© 1997 Trans Tech Publications Ltd. All Rights Reserved

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