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Abstracts
Observability of Atomic Defects by Atomic Force Microscopy
a.684
Non Stoichiometry-Related Defects during Growth of Semiconductor Crystals
a.685
Evolution of Vacancy Densities in Powder Particles during Milling
a.686
Interference between Elastic-Phonon Scattering and Point Defects
a.687
Defect Characteristics and Boron-Cluster Ion-Implantation
a.688
Photoconductivity Techniques for the Defect Spectroscopy of Photovoltaics
a.689
Molecular Dynamics Study of Defects in Quenched States
a.690
Heterogeneous Void Swelling Near Grain Boundaries in Irradiated Materials
a.691
Semiconductors, with and without Defects, under Pressure
a.692
HomeDefect and Diffusion ForumDefects and Diffusion in Semiconductors VIDefect Characteristics and Boron-Cluster...

Defect Characteristics and Boron-Cluster Ion-Implantation

Page: A688

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