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HomeDefect and Diffusion ForumDefect and Diffusion Forum Vols. 237-240Application of the Spectroscopic Ellipsometry for...

Application of the Spectroscopic Ellipsometry for the CoSi₂ Silicide Formation Induced by Thermal Annealing of Co/Si Multilayered Films

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Diffusion in Materials - DIMAT2004

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Periodical:

Defect and Diffusion Forum (Volumes 237-240)

Pages:

572-577

DOI:

https://doi.org/10.4028/www.scientific.net/DDF.237-240.572

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Online since:

April 2005

Authors:

Y.V. Kudryavtsev, Sergey I. Sidorenko, Yu.N. Makogon, E.P. Pavlova, T.I. Verbitskaya, Y.P. Lee, Y.H. Hyun, V.A. Oksenenko

Keywords:

Cobalt Silicides, Multilayered Films, Optical Property, Solid-State Reaction, Spectroscopic Ellipsometry (SE)

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© 2005 Trans Tech Publications Ltd. All Rights Reserved

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